JET VAPOR-DEPOSITION OF ORGANIC GUEST INORGANIC HOST THIN-FILMS FOR OPTICAL AND ELECTRONIC APPLICATIONS

Citation
Jz. Zhang et al., JET VAPOR-DEPOSITION OF ORGANIC GUEST INORGANIC HOST THIN-FILMS FOR OPTICAL AND ELECTRONIC APPLICATIONS, Journal of electronic materials, 23(11), 1994, pp. 1239-1244
Citations number
12
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
23
Issue
11
Year of publication
1994
Pages
1239 - 1244
Database
ISI
SICI code
0361-5235(1994)23:11<1239:JVOOGI>2.0.ZU;2-L
Abstract
The optical and electronic properties of organic molecules suggest app lication in hybrid optical-electronic integrated circuits and thin fil m devices, but pure, high quality, organic solid films are difficult t o make. A better approach is to trap organic molecules as guests at hi gh concentration in a durable host-guest film. Polymer, plastic, and s ol-gel films can serve as hosts,(1-3) but their properties are less th an ideal, and the techniques for making them time consuming and involv ed. Here we describe our Jet Vapor Deposition (JVD) technology for tra pping complex organic dyes in hard, adherent inorganic hosts. Jet vapo r deposition is the only vapor deposition technique able to make organ ic-ceramic films, and it offers a number of advantages over other appr oaches. Individual organic guests can be trapped at high doping levels of several percent, and the possible combinations of guest and host a re nearly unlimited. The properties of vapor deposited ceramic hosts a re superior to those of polymer hosts. Deposition at high rate and roo m temperature enables reliable, high throughput, economic production, and renders JVD compatible with semiconductor vapor deposition technol ogy. Here we review the principles of JVD, describe experimental appli cations to thin film waveguides, lasers, and chemical sensors, and dis cuss some of the properties of JVD host-guest materials.