DEPTH PROFILING FREE CARBON IN SILICON-CARBIDE

Authors
PAULSON TE BOJAN VJ WICHTERMAN BM PANTANO CG
Citation
Te. Paulson et al., DEPTH PROFILING FREE CARBON IN SILICON-CARBIDE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 1267-1274
Citations number
16
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
13
Issue
3
Year of publication
1995
Part
2
Pages
1267 - 1274
Database
ISI
SICI code
0734-2101(1995)13:3<1267:DPFCIS>2.0.ZU;2-Y