EPITAXIAL-GROWTH OF A METAL(COSI2) INSULATOR(CAF2) NANOMETER-THICK HETEROSTRUCTURE AND ITS APPLICATION TO QUANTUM-EFFECT DEVICES

Authors
ASADA M WATANABE M SUEMASU T KOHNO Y SAITOH W
Citation
M. Asada et al., EPITAXIAL-GROWTH OF A METAL(COSI2) INSULATOR(CAF2) NANOMETER-THICK HETEROSTRUCTURE AND ITS APPLICATION TO QUANTUM-EFFECT DEVICES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 623-628
Citations number
29
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
13
Issue
3
Year of publication
1995
Part
1
Pages
623 - 628
Database
ISI
SICI code
0734-2101(1995)13:3<623:EOAMIN>2.0.ZU;2-T