DEPOSITION OF ALN AT LOWER TEMPERATURES BY ATMOSPHERIC METALORGANIC CHEMICAL-VAPOR-DEPOSITION USING DIMETHYLETHYLAMINE ALANE AND AMMONIA

Authors
KIDDER JN KUO JS LUDVIKSSON A PEARSALL TP ROGERS JW GRANT JM ALLEN LR HSU ST
Citation
Jn. Kidder et al., DEPOSITION OF ALN AT LOWER TEMPERATURES BY ATMOSPHERIC METALORGANIC CHEMICAL-VAPOR-DEPOSITION USING DIMETHYLETHYLAMINE ALANE AND AMMONIA, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 711-715
Citations number
45
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
13
Issue
3
Year of publication
1995
Part
1
Pages
711 - 715
Database
ISI
SICI code
0734-2101(1995)13:3<711:DOAALT>2.0.ZU;2-C