MAGNETRON REACTIVE ION ETCHING OF ALN AND INN IN BCL3 PLASMAS

Authors
MCLANE GF CASAS L LAREAU RT ECKART DW VARTULI CB PEARTON SJ ABERNATHY CR
Citation
Gf. Mclane et al., MAGNETRON REACTIVE ION ETCHING OF ALN AND INN IN BCL3 PLASMAS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 724-726
Citations number
16
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
13
Issue
3
Year of publication
1995
Part
1
Pages
724 - 726
Database
ISI
SICI code
0734-2101(1995)13:3<724:MRIEOA>2.0.ZU;2-M