A NOVEL TECHNIQUE FOR CHARACTERIZING THE SURFACE COVERAGE OF THIN-FILM CHEMICAL-VAPOR-DEPOSITION IN ULTRA-HIGH-ASPECT-RATIO MICROSTRUCTURES

Authors
SOAVE RJ TASKER GW THEN AM MAYER JW SHACHAMDIAMAND Y
Citation
Rj. Soave et al., A NOVEL TECHNIQUE FOR CHARACTERIZING THE SURFACE COVERAGE OF THIN-FILM CHEMICAL-VAPOR-DEPOSITION IN ULTRA-HIGH-ASPECT-RATIO MICROSTRUCTURES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 1027-1031
Citations number
9
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
13
Issue
3
Year of publication
1995
Part
1
Pages
1027 - 1031
Database
ISI
SICI code
0734-2101(1995)13:3<1027:ANTFCT>2.0.ZU;2-0