HG1-XCDXTE - ELECTRICAL AND STRUCTURAL-CHANGES INDUCED BY RAPID THERMAL ANNEALING

Citation
J. Sangrador et al., HG1-XCDXTE - ELECTRICAL AND STRUCTURAL-CHANGES INDUCED BY RAPID THERMAL ANNEALING, Journal of crystal growth, 151(3-4), 1995, pp. 254-260
Citations number
12
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
151
Issue
3-4
Year of publication
1995
Pages
254 - 260
Database
ISI
SICI code
0022-0248(1995)151:3-4<254:H-EASI>2.0.ZU;2-L
Abstract
The combined electrical and structural characterization of encapsulate d HgCdTe annealed in a rapid thermal processor under different tempera tures and times is presented. Hall effect measurements are used for th e determination of the changes in carrier concentration and mobility p roduced during the annealing, while structural changes due to the ther mal treatment are deduced from channelled proton-induced X-ray emissio n measurements. The results indicate that both the carrier concentrati on and mobility change homogeneously throughout the crystal, reaching equilibrium values that are only a function of the annealing temperatu re. The evolution towards equilibrium of each parameter can be fitted to exponential laws, the time constants being a function of the anneal ing temperature. However, the time required to reach the equilibrium m obility is always longer (by about X3.5) than that needed to saturate the carrier concentration, for the same temperature. The crystallinity of the samples also shows a dependence on the annealing temperature. These changes are explained on the basis of generation and annihilatio n of mercury vacancies through the interaction with tellurium precipit ates.