DEPTH PROFILE ANALYSIS OF PLASMA-ASSISTED CVD HARD MATERIALS COATINGS

The wear resistance of homogeneous and multilayer TiNx-, TiCxNy- and T iCx-coatings is considerably determined by the layer composition and b y the conditions at the interface. This work deals with the possibilit ies of different depth profile analysis methods for the study of TiNx and TiCx layers on hard metal and steel substrates prepared by plasma assisted CVD technique, and furthermore it demonstrates the performanc e of Factor analysis for detailed investigation of a multilayer system consisting of amorphous C and TiCx single layers. The hard materials coatings were investigated by different methods of depth profile analy sis, which may be an important tool in the research of thin layer depo sition for wear applications. The following techniques were used: GDOE S, analytical TEM, electron microdiffraction and AUGER electron spectr oscopy. By means of the combined application of energy dispersive X-ra y spectrometry and microdiffraction a correlation of the depth profile s of both elemental concentrations and lattice parameters in TiC, coat ings could be revealed.