STRUCTURE INVESTIGATIONS OF THIN MOSX FILMS

The influence of process parameters on the formation of microstructure of magnetron-sputtered MoSx-films on silicon wafers was investigated. The MoSx-films were analyzed by means of X-ray diffraction and TEM. T he prepared MoSx-films show a microstructure in dimension of some nm w ithout any prefered orientation or texture. The X-ray diffraction meas urements indicate clearly differences in the structure for various pre paration conditions. Simulations provided a first structural model for the description of the MoSx-films. The MoSx-films consist of two-dime nsional nanocrystals and noncrystallographic randomly packed (001) pla nes. Transitions between these structural states and intermediate stat es determine the microstructure depending on the preparation condition s.