DX-CENTER ENERGY-LEVEL DEPENDENCE ON SILICON DOPING CONCENTRATION IN AL0.3GA0.7AS

Citation
G. Medeirosribeiro et al., DX-CENTER ENERGY-LEVEL DEPENDENCE ON SILICON DOPING CONCENTRATION IN AL0.3GA0.7AS, Journal of electronic materials, 24(7), 1995, pp. 907-912
Citations number
16
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
24
Issue
7
Year of publication
1995
Pages
907 - 912
Database
ISI
SICI code
0361-5235(1995)24:7<907:DEDOSD>2.0.ZU;2-K
Abstract
The Hall free carrier concentration of silicon-doped Al0.3Ga0.7As allo ys is studied as a function of both temperature and illumination. Diff erent thermal activation energies were observed for the DX center as a function of silicon concentration. Excitation of the samples using an infra-red source also provided data for better insight into the DX ce nter population. We correlated the incremental free electron photo per sistent population with the activation energies obtained from the temp erature dependence of the measured Hall concentration. We concluded th at large free carrier concentrations can yield perturbations in the la ttice potential that may alter the configuration coordinate energy bar riers for capture and emission of electrons by and from the DX centers .