EFFECT OF NI ON GRAPHITE THIN-FILM FORMATION FROM ORGANIC MATERIALS BY CHEMICAL-VAPOR-DEPOSITION

Authors
YUDASAKA M KIKUCHI R MATSUI T TASAKA K OHKI Y YOSHIMURA S OTA E
Citation
M. Yudasaka et al., EFFECT OF NI ON GRAPHITE THIN-FILM FORMATION FROM ORGANIC MATERIALS BY CHEMICAL-VAPOR-DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(4), 1995, pp. 2142-2145
Citations number
7
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Journal title
Journal of vacuum science & technology. A. Vacuum, surfaces, and films → ACNP
ISSN journal
07342101
Volume
13
Issue
4
Year of publication
1995
Pages
2142 - 2145
Database
ISI
SICI code
0734-2101(1995)13:4<2142:EONOGT>2.0.ZU;2-Y
Abstract
Two functions of Ni in the process of graphite thin-film formation fro m organic materials by chemical vapor deposition (CVD) were studied. W hen dehydrogenation of a certain organic material was enhanced by Ni d uring CVD at 600 and 700 degrees C, the graphite thin film could be fo rmed on Ni at these temperatures. On the other hand, a lot of organic materials changed into graphite by CVD on Ni above 800 degrees C, whic h corresponds to the obtained result that Ni deposited on disordered g raphite changed the disordered graphite to crystalline one by heat tre atment above 800 degrees C. (C) 1995 American Vacuum Society.