CHEMICAL-DEPOSITION OF BI2S3 THIN-FILMS FROM THIOACETAMIDE BATH

Citation
Jd. Desai et Cd. Lokhande, CHEMICAL-DEPOSITION OF BI2S3 THIN-FILMS FROM THIOACETAMIDE BATH, Materials chemistry and physics, 41(2), 1995, pp. 98-103
Citations number
20
Categorie Soggetti
Material Science
ISSN journal
02540584
Volume
41
Issue
2
Year of publication
1995
Pages
98 - 103
Database
ISI
SICI code
0254-0584(1995)41:2<98:COBTFT>2.0.ZU;2-1
Abstract
Bi2S3 thin films have been deposited from an aqueous acidic bath using thioacetamide CH3-CS-NH2 (TAM) as a sulfide ion source. The preparati ve parameters are optimized and growth mechanism is discussed. X-ray d iffractograms indicate that the films are polycrystalline in nature. A microstructural study has been carried out using a scanning electron microscopy technique. From optical absorption studies the energy bandg ap of Bi2S3 is estimated to be 1.84 eV. Room temperature resistivity i s of the order of 10(5) ohm cm.