LANGMUIR PROBE MEASUREMENTS DURING PLASMA-ACTIVATED CHEMICAL-VAPOR-DEPOSITION IN THE SYSTEM ARGON HYDROGEN/DICYCLOPENTADIENYLDIMETHYLHAFIUM/

A Langmuir probe investigation of Ar/H-2/Cp(2)HfMe(2) plasmas is descr ibed. The probe measurements were performed for various discharge cond itions. The mean electron energy and electron density were measured fo r various power, gas flows of argon, and hydrgen and precursor concent rations. Addition of the precursor into the discharge resulted in an a ppreciable decrease in the electron density and art increase in the me an electron energy. Whereas a transition from the alpha-mode to the ga mma-mode has beert observed with power rise in the Ar/H-2 plasmas with out precursor in the presence of the precursor the plasma alpha-mode r emained unchanged in the power range investigated.