D. Schmittlandsiedel et al., CRITICAL AREA ANALYSIS FOR DESIGN-BASED YIELD IMPROVEMENT OF VLSI CIRCUITS, Quality and reliability engineering international, 11(4), 1995, pp. 227-232
Yield improvements can be achieved by both contamination control (manu
facturing) and defect sensitivity decrease (design). In this paper, th
e need for critical area analysis is demonstrated for design based yie
ld prediction and improvement. Experimental results for a typical CMOS
process are provided.