PHOTOELECTRIC-EMISSION AND CONDUCTANCE STUDIES ON FULLY FABRICATED PHEMTS

Citation
F. Schuermeyer et al., PHOTOELECTRIC-EMISSION AND CONDUCTANCE STUDIES ON FULLY FABRICATED PHEMTS, Solid-state electronics, 38(9), 1995, pp. 1615-1618
Citations number
13
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
ISSN journal
00381101
Volume
38
Issue
9
Year of publication
1995
Pages
1615 - 1618
Database
ISI
SICI code
0038-1101(1995)38:9<1615:PACSOF>2.0.ZU;2-0
Abstract
Photoelectric measurement techniques are ideally suited to investigate barrier and bandgap energies in pseudomorphic heterostructure FETs. I n these devices the bandgap in the channel is smaller than that of the substrate and hence there exists a wavelength window in which the sub strate is transparent and the channel is absorbing. Consequently, phot oelectric measurements can be performed on fully fabricated PHEMTs usi ng backside illumination. In this paper we describe photocurrent measu rements for two distinct processes: photoemission of carriers between the Schottky gate and the channel, and photoconduction through the cha nnel. We have successfully modeled the observed shift in the onset of photoconduction using a self-consistent Schrodinger-Poisson solution. The peak photocurrent magnitude shows non-monotonic dependence on gate bias, possibly suggesting amplification of the photocurrent.