AN ANALYTICAL BACK GATE BIAS DEPENDENT SUBTHRESHOLD SWING MODEL FOR ACCUMULATION-MODE P-CHANNEL SOI MOSFETS

Authors
Citation
Gf. Niu et G. Ruan, AN ANALYTICAL BACK GATE BIAS DEPENDENT SUBTHRESHOLD SWING MODEL FOR ACCUMULATION-MODE P-CHANNEL SOI MOSFETS, Solid-state electronics, 38(10), 1995, pp. 1805-1810
Citations number
9
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
ISSN journal
00381101
Volume
38
Issue
10
Year of publication
1995
Pages
1805 - 1810
Database
ISI
SICI code
0038-1101(1995)38:10<1805:AABGBD>2.0.ZU;2-I
Abstract
An analytical back gate bias dependent subthreshold swing model of the accumulation-mode p-channel SOI MOSFETs is derived using the exponent ial dependence of the carrier concentrations on the potential through the silicon film. The subthreshold swing is shown to be proportional t o the reciprocal of the derivative of the minimum potential through th e silicon film with respect to the front gate voltage. The subthreshol d swing is compared to that in the enhancement-mode devices, and its d ependencies on device parameters and back gate bias are studied. Based on the model, a method of extraction of front and back interface trap densities in these devices from subthreshhold swing is suggested.