STUDY OF TITANIUM-NITROGEN FILMS DEPOSITED IN AN ELECTRON-BEAM EVAPORATION UNIT

Comparative studies were performed on the chemical composition, crysta l structure, adhesion, and color of titanium-nitrogen films prepared b y an electron beam thermal evaporation process. Several parameters, de position rate, nitrogen flow rate, substrate temperature, and nitrogen inlet location, were varied during sample preparation. The compositio n of the films was determined by electron probe microanalysis, the cry stal structure by grazing angle x-ray diffraction, and the adhesion ch aracteristics by scratch test analysis. Glass substrates were used to allow for visual inspection of the substrate-film interface layer. Tit anium-nitrogen films with nitrogen contents varying between 7.61 and 3 2.5 wt % were produced. Over this range, three structures were deposit ed: alpha-Tin(0.3) for low nitrogen contents, Ti2N for films of 12.2-1 3.1 wt % nitrogen, and TiN for films with higher nitrogen contents. Th e films exhibited a wide range of colors that could be related to othe r properties such as nitrogen content and adhesion. (C) 1995 American Vacuum Society.