Hs. Tao et al., RADIATION-INDUCED DECOMPOSITION OF PF3 ON RU(0001), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(5), 1995, pp. 2553-2557
Citations number
16
Categorie Soggetti
Physics, Applied","Materials Science, Coatings & Films
Soft x-ray photoelectron spectroscopy using synchrotron radiation has
been employed to study the decomposition of PF3 on Ru(0001) at 80 K in
duced by energetic electrons. Due to the large binding energy shifts i
n the P 2p core levels, the phosphorus-containing surface intermediate
s produced from the electron-induced decomposition of PF3 can be ident
ified and their evolution can be followed as the fluence of electrons
is changed. A stepwise decomposition of PF3, induced by energetic elec
trons, i.e., PF3 --> PF2 --> PF --> P, is observed. The dissociation c
ross section for PF3 --> PF2 induced by 550 eV electrons is measured t
o be on the order of similar to 1 X 10(-16) cm(2). The main channels t
hat lead to PF3 dissociation involve the excitation of F 2s as well as
valence states of PF3. (C) 1995 American Vacuum Society.