ELECTRON EJECTION PROCESSES AT INSULATOR-SEMICONDUCTOR INTERFACES IN ACTFEL DISPLAY DEVICES

Citation
S. Bhaskaran et al., ELECTRON EJECTION PROCESSES AT INSULATOR-SEMICONDUCTOR INTERFACES IN ACTFEL DISPLAY DEVICES, I.E.E.E. transactions on electron devices, 42(10), 1995, pp. 1756-1762
Citations number
20
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
ISSN journal
00189383
Volume
42
Issue
10
Year of publication
1995
Pages
1756 - 1762
Database
ISI
SICI code
0018-9383(1995)42:10<1756:EEPAII>2.0.ZU;2-X
Abstract
Luminance, conduction current and threshold voltage of ZnS:Mn ac thin film electroluminescent display devices were measured as functions of device temperature (10 K-300 K) and risetime of the excitation voltage pulse (2 mu s-50 mu s). Results provided insight into the electron ej ection mechanism at the insulator-phosphor interfaces. It was found th at the distribution of interface state electrons at the beginning of t he excitation voltage pulse varied substantially with device temperatu re. Pure tunneling is thought to be the dominant electron ejection mec hanism at the beginning of the voltage pulse while phonon-assisted tun neling is responsible for altering the interface electron distribution during the interval between the pulses. A delay of several microsecon ds was observed in the build up of the transferred charge. It is attri buted to the relatively small population of electrons available at the insulator-phosphor interface.