Ms. Chan et al., ESD RELIABILITY AND PROTECTION SCHEMES IN SOI CMOS OUTPUT BUFFERS, I.E.E.E. transactions on electron devices, 42(10), 1995, pp. 1816-1821
The electrostatic discharge (ESD) protection capability of SOI CMOS ou
tput buffers has been studied with Human Body Model (HEM) stresses. Ex
perimental results show that the ESD voltage sustained by SOI CMOS buf
fers is only about half the voltage sustained by the bulk NMOS buffers
. ESD discharge current in a SOI CMOS buffer is found to be absorbed b
y the NMOSFET alone. Also, SOI circuits display more serious reliabili
ty problem in handling negative ESD discharge current during bi-direct
ional stresses, Most of the methods developed for bulk technology to i
mprove ESD performance have minimal effects on SOI. A new Through Oxid
e Buffer ESD protection scheme is proposed as an alternative for SOI E
SD protection, Zn order to improve ESD reliability, ESD protection cir
cuitries can be fabricated on the SOI substrate instead of the top sil
icon thin film, after selectively etching through the buried oxide. Th
is scheme also allows ESD protection strategies developed for bulk tec
hnology to be directly transferred to SOI substrate.