IMPACT OF SILICIDATION ON THE EXCESS NOISE BEHAVIOR OF MOS-TRANSISTORS

Citation
Ep. Vandamme et al., IMPACT OF SILICIDATION ON THE EXCESS NOISE BEHAVIOR OF MOS-TRANSISTORS, Solid-state electronics, 38(11), 1995, pp. 1893-1897
Citations number
12
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied","Physics, Condensed Matter
Journal title
ISSN journal
00381101
Volume
38
Issue
11
Year of publication
1995
Pages
1893 - 1897
Database
ISI
SICI code
0038-1101(1995)38:11<1893:IOSOTE>2.0.ZU;2-Q
Abstract
The excess noise behaviour of silicided and non-silicided p- and n-cha nnel MOSTs, biased in the ohmic region, has been investigated. Only a minor difference in noise and series resistance could be seen for the n-channel MOSTs. However, the noise in the non-silicided p-MOSTs was d ominated by the noise in the series resistance. The series resistance for the non-silicided p-MOSTs was more than four times higher than for the silicided p-MOSTs. A modified model for the 1/f noise equivalent circuit is proposed, showing good agreement with experimental results and explaining the observed trend S(ld)proportional to I-d(m) with 0 < m < 4. The classical geometry dependence of the current noise in MOST s is only valid if the noise in the series resistance is negligible.