The operation time of the cathode of high-power electron guns under un
favourable vacuum conditions is limited by ion bombardment. Theoretica
l estimates of the dependence of the sputtering rate on the origin of
the ions indicate that ions generated in the whole acceleration gap co
ntribute to the destruction. A permanent magnetic deflector incorporat
ed in the Wehnelt electrode is used to form a transverse magnetic fiel
d close to the cathode which decreases strongly towards the anode. Due
to the different Lorentz force acting on particles of equal kinetic e
nergy but different mass, the electrons are strongly deflected already
close to the cathode while most ions, following the electric field, h
it the cathode far from the emitting area. The resulting deflection of
the electron beam is compensated by a mechanical gun shift and anothe
r magnetic deflecting system beneath the anode. Thus, an effective pro
tection device for the cathode of a 35 keV electron gun for intaglio p
rinting engravure was developed which extends the operational time at
45 mA beam current in a vacuum of 8 . 10(-3) Pa from 1/2 h to 10 h. Us
ing an inert gas to avoid reactive removal some further improvement is
possible. The ion separator would even become dispensable if Helium g
as could be applied.