Gs. Cargill et al., CHARACTERIZATION OF LATTICE STRAIN FROM DX-CENTERS AND PERSISTENT PHOTOCARRIERS IN GAALAS, Materials chemistry and physics, 42(2), 1995, pp. 138-141
We discuss the results of high resolution, low temperature X-ray diffr
action measurements used to determine the lattice strain caused by ele
ctron emission from Sn- and Si-related DX centers in Ga1-xAlxAs. DX ce
nters are deep levels associated with donors in various III-V semicond
uctors, and they are responsible for persistent photoconductivity and
other unusual electrical and optical properties of these materials. Al
though DX centers have been extensively studied for more than a decade
, information is still needed about the atomic arrangements that compr
ise DX centers for various donor and host systems. Our lattice strain
measurements show that there is lattice expansion attributable to loca
l bonding changes that occur when the DX centers are emptied. This res
ult is important in testing proposed structural models for the DX cent
er, and it can be used to rule out a proposal that symmetric breathing
-mode relaxation is responsible for a DX(-) state for Sn-doped Ga1-xAl
xAs. The theoretical proposal by Chadi (Phys. Rev. B, 46 (1992) 6777)
requires an inward relaxation when a Sn-related DX center is emptied,
but our experiments show an outward relaxation.