Kl. Whittingham et al., GROWTH OF GAINP GAASP SHORT-PERIOD SUPERLATTICES BY FLOW MODULATION ORGANOMETALLIC VAPOR-PHASE EPITAXY/, Journal of electronic materials, 24(11), 1995, pp. 1611-1615
One disadvantage of the GaInP/GaAs system is the difficulty often enco
untered in synthesizing the quaternary material GaInAsP, required to s
pan the intermediate bandgap range (1.42-1.91 eV). Recent studies repo
rt on an extensive miscibility gap in this alloy. In this study, we in
vestigate an alternative approach to the growth of material within thi
s bandgap range. We have grown by flow-modulation organometallic vapor
phase epitaxy, GaInP/GaAsP superlattices with periods ranging from 80
to 21 Angstrom. These are the first reported short-period superlattic
es in this material system. Effects of superlattice (SL) period, growt
h temperature, and phosphorous composition in the wells were studied b
y photoluminescence, high resolution x-ray diffraction, atomic force m
icroscopy, and transmission electron microscopy. The effect of growth
temperature on the structural quality of the SLs is correlated to orde
ring effects in the GaInP layers. Variations in the P composition and
the SL period result in a shift in the room temperature bandgap emissi
on from 1.51 to 1.74 eV. Strain-compensated structures have been reali
zed by growing the SL barriers in compression.