MORPHOLOGICAL PROPERTIES OF CHEMICAL-VAPOR-DEPOSITED ALN FILMS

Authors
RODRIGUEZCLEMENTE R ASPAR B AZEMA N ARMAS B COMBESCURE C DURAND J FIGUERAS A
Citation
R. Rodriguezclemente et al., MORPHOLOGICAL PROPERTIES OF CHEMICAL-VAPOR-DEPOSITED ALN FILMS, Journal of crystal growth, 133(1-2), 1993, pp. 59-70
Citations number
30
Categorie Soggetti
Crystallography
Journal title
Journal of crystal growth → ACNP
ISSN journal
00220248
Volume
133
Issue
1-2
Year of publication
1993
Pages
59 - 70
Database
ISI
SICI code
0022-0248(1993)133:1-2<59:MPOCAF>2.0.ZU;2-M
Abstract
In this paper we analyse some results on AlN CVD film deposition, publ ished in the literature, from a morphological point of view, and we pr opose a model to explain the observed preferential orientations based on the reactivity of the AlN crystal faces of the equilibrium form.