PRECISION COMPARISON OF SURFACE-TEMPERATURE MEASUREMENT TECHNIQUES FOR GAAS ICS

Citation
M. Nishiguchi et al., PRECISION COMPARISON OF SURFACE-TEMPERATURE MEASUREMENT TECHNIQUES FOR GAAS ICS, IEEE transactions on components, hybrids, and manufacturing technology, 16(5), 1993, pp. 543-549
Citations number
29
Categorie Soggetti
Material Science","Engineering, Eletrical & Electronic
ISSN journal
01486411
Volume
16
Issue
5
Year of publication
1993
Pages
543 - 549
Database
ISI
SICI code
0148-6411(1993)16:5<543:PCOSMT>2.0.ZU;2-K
Abstract
Surface temperature measurement technology for GaAs integrated circuit s (IC's) is one of the most fundamental for investigating thermoreliab ility relationships, but has not yet been established. We have careful ly examined the three predominant techniques and have compared their p recision quantitatively. Although infrared microscopy was found to lac k precision more than was previously believed, a measurement procedure with high accuracy has been successfully established based on the dio de drop technique, an electrical method, and the transition point tech nique: a liquid crystal method. The latter has been determined to have a precision as great as +/-2-degrees-C for measuring the actual hot s pot of nonsealed GaAs IC's. The former is the only method which is use ful for sealed IC's. Though it cannot provide the actual hot spot info rmation, an accurate temperature with at most +/- 1-degrees-C error ha s been obtained at 15 mum from the spot by utilizing small sized (3.0 mum by 1.5 mum) diodes.