E. Simoen et al., A LOW-FREQUENCY NOISE STUDY OF GATE-ALL-AROUND SOI TRANSISTORS, I.E.E.E. transactions on electron devices, 40(11), 1993, pp. 2054-2059
In this paper, the low-frequency noise characteristics of both n and p
-type gate-all-around (GAA) SOI MOS transistors are reported and compa
red with the noise behavior of conventional, partially depleted (PD) S
OI transistors. As will be demonstrated, the input-referred noise of n
-channel GAA transistors is considerably lower than for standard ones,
which is related to the higher device transconductance, coupled to th
e occurrence of volume inversion. P-channel devices have a one order o
f magnitude lower noise spectral density than n-MOST's, which is due t
o the corresponding lower density of interface traps. GAA p-MOST's ten
d to have a lower average noise in weak inversion than their standard-
SOI counterparts. In strong inversion, the reverse situation is often
found. Finally, it will be demonstrated that in n-type GAA transistors
no kink-related excess noise is observed, which is an additional bene
fit for using this type of SOI technology.