INFLUENCE OF GROWTH TEMPERATURES ON THE PHOTORESPONSE OF LOW-TEMPERATURE-GROWN GAAS-AS P-I-N-DIODES

Citation
A. Srinivasan et al., INFLUENCE OF GROWTH TEMPERATURES ON THE PHOTORESPONSE OF LOW-TEMPERATURE-GROWN GAAS-AS P-I-N-DIODES, Journal of electronic materials, 22(12), 1993, pp. 1457-1459
Citations number
21
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
22
Issue
12
Year of publication
1993
Pages
1457 - 1459
Database
ISI
SICI code
0361-5235(1993)22:12<1457:IOGTOT>2.0.ZU;2-R
Abstract
We report a study of the sub-bandgap photoresponse of p-i-n photodetec tors with 1 mu m low-temperature intrinsic layers, and its dependence on the growth temperature of the intrinsic layer. Diodes with intrinsi c layers grown near 250 degrees C exhibit the highest photoresponse. T he photoresponse decreases gradually as the growth temperature is rais ed above 250 degrees C. For growth temperatures at or below 200 degree s C, a drastic drop in the photoresponse is observed, along with degra dation of crystal quality in the material. The extracted internal Scho ttky barrier heights are found to be within the range 0.7-0.8 eV.