PATTERNING OF ORGANIC LAYERS USING NEGATIVE AND POSITIVE WORKING TOP-CARL PROCESS

Authors
LEUSCHNER R AHNE H MARQUARDT U NICKEL U SCHMIDT E SEBALD M SEZI R
Citation
R. Leuschner et al., PATTERNING OF ORGANIC LAYERS USING NEGATIVE AND POSITIVE WORKING TOP-CARL PROCESS, Microelectronic engineering, 20(4), 1993, pp. 305-319
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
20
Issue
4
Year of publication
1993
Pages
305 - 319
Database
ISI
SICI code
0167-9317(1993)20:4<305:POOLUN>2.0.ZU;2-I
Abstract
The Top-CARL process is a technique for patterning organic materials s ome tens of microns thick by top-resist silylation and pattern transfe r via oxygen reactive ion etching. The influence of exposure dose, tem perature and top-resist layer thickness on the silylation process is s tudied. A dyed version of the resist is examined. Its polarity can be changed from negative to positive working by addition of a small amoun t of a photo base.