OPTIMIZATION OF MAXIMUM DIFFRACTION EFFICIENCY OF PHOTORESIST GRATINGS

Authors
SALMINEN O SORMUNEN K KEINONEN T SAVANDER P
Citation
O. Salminen et al., OPTIMIZATION OF MAXIMUM DIFFRACTION EFFICIENCY OF PHOTORESIST GRATINGS, Optik, 95(2), 1993, pp. 49-52
Citations number
29
Categorie Soggetti
Optics
Journal title
Optik → ACNP
ISSN journal
00304026
Volume
95
Issue
2
Year of publication
1993
Pages
49 - 52
Database
ISI
SICI code
0030-4026(1993)95:2<49:OOMDEO>2.0.ZU;2-R
Abstract
The properties of the photoresist layers spin-coated from the mixture of the Shipley AZ 1350 and AZ 1450J photoresist were investigated by u sing a scanning electron microscope. Four different AZ 351 developer c oncentrations were used. The development time for the maximum diffract ion efficiency as a function of the exposure and the developer concent ration was evaluated for the experimental data.