PASSIVATION OF GASB BY SULFUR TREATMENT

Citation
M. Perotin et al., PASSIVATION OF GASB BY SULFUR TREATMENT, Journal of electronic materials, 23(1), 1994, pp. 7-12
Citations number
22
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
23
Issue
1
Year of publication
1994
Pages
7 - 12
Database
ISI
SICI code
0361-5235(1994)23:1<7:POGBST>2.0.ZU;2-M
Abstract
Some features of the band structure of GaSb have led to a renewed inte rest in this material. It is well known that Ga(Al)Sb alloys are good candidates to realize avalanche photodetectors, due to their high hole kp/electron kn ionization coefficient ratio.(1-3) In addition, recent studies have shown GaSb to be attractive for realizing tunneling barr iers exhibiting a high value of the peak-to-valley current ratio(4-6) or IR photodectectors. In order to optimize such devices, the passivat ion of GaSb is of great interest. Unfortunately, very few investigatio ns have been reported in the literature on GaSb passivation.(7-8) This paper reports experimental results concerning GaSb surface passivatio n using a chemical sulfuration method. Physicochemical analysis is att empted through ellipsometric, photoluminescence, and Auger electron sp ectroscopy measurements. Polluting oxygen and carbon agents are found to be removed from the surface using this process, leading to Schottky diodes of better quality. In addition, the sulfur treatment is shown to stabilize the cleaned surface.