In recent years there has been a great upsurge of applications involvi
ng quantitative high-resolution electron microscopy, in particular com
paring experimental micrographs with image simulations for determinati
on of defect structures. Emphasis has been given to the determination
of experimental parameters, the utilization of slow-scan CCD cameras f
or digital recording and extraction of quantitative structural and che
mical information. More attention to surface cleanliness is needed to
improve signal quality and the possibility of electron irradiation dam
age should not be overlooked. Issues related to adoption of a reliabil
ity or R-factor are briefly discussed.