The Rossendorf Focused Ion Beam IMSA-100 was used for writing implanta
tion of cobalt (E = 30 keV Co+ and 60 keV Co++; D = 0.5 ... 5 x 10(17)
cm(-2)) at room temperature to form CoSi2 microstructures on silicon
by ion beam synthesis. For that aim two types of Liquid Alloy Ion Sour
ses (LAIS) were developed. As implanted and annealed (600 degrees C fo
r 60 min and 1000 degrees C for 30 min in N-2 atmosphere) silicide str
uctures were analysed by SEM, EDX and electrical measurements.