PHYSICAL LIMITS OF SUPERRESOLUTION LITHOGRAPHY

Authors
HILD R NITZSCHE G ALTENBURGER U
Citation
R. Hild et al., PHYSICAL LIMITS OF SUPERRESOLUTION LITHOGRAPHY, Microelectronic engineering, 23(1-4), 1994, pp. 179-182
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
23
Issue
1-4
Year of publication
1994
Pages
179 - 182
Database
ISI
SICI code
0167-9317(1994)23:1-4<179:PLOSL>2.0.ZU;2-1
Abstract
From viewpoint of partially coherent imaging theory we discuss resolut ion and depth of focus for L/S-structures and isolated structures. It could be shown that it is not possible to increase the transferable fr equency for L/S-structures. The effect of resolution improvement for L /S-structures is caused by a contrast enhancement only. For isolated s tructures the pupil transmission is mainly responsible for the intensi ty distribution on the wafer.