ENHANCEMENT OF REFLECTIVITY OF MULTILAYER MIRRORS FOR SOFT-X-RAY PROJECTION LITHOGRAPHY BY TEMPERATURE OPTIMIZATION AND ION-BOMBARDMENT

Authors
LOUIS E VOORMA HJ KOSTER NB SHMAENOK L BIJKERK F SCHLATMANN R VERHOEVEN J PLATONOV YY VANDORSSEN GE PADMORE HA
Citation
E. Louis et al., ENHANCEMENT OF REFLECTIVITY OF MULTILAYER MIRRORS FOR SOFT-X-RAY PROJECTION LITHOGRAPHY BY TEMPERATURE OPTIMIZATION AND ION-BOMBARDMENT, Microelectronic engineering, 23(1-4), 1994, pp. 215-218
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
23
Issue
1-4
Year of publication
1994
Pages
215 - 218
Database
ISI
SICI code
0167-9317(1994)23:1-4<215:EOROMM>2.0.ZU;2-M
Abstract
In this paper we discuss two techniques to optimize the quality of mul tilayer x-ray mirrors, namely optimization of the temperature of the s ubstrates during deposition and ion-bombardment of the layers. We prod uced Mo/Si multilayers applying both methods and present the effect on the near normal incidence reflectivity for lambda=13-14 nm radiation. Furthermore an analysis of the homogeneity of the deposited layers is given.