Fj. Pantenburg et al., ADHESION PROBLEMS IN DEEP-ETCH X-RAY-LITHOGRAPHY CAUSED BY FLUORESCENCE RADIATION FROM THE PLATING BASE, Microelectronic engineering, 23(1-4), 1994, pp. 223-226
During the irradiation with synchrotron radiation, electrons and fluor
escence photons are created in those regions of the plating base which
are underneath the absorbers. This secondary radiation damages the re
sist at the interface to the plating base and may lead to bad adhesion
after development. Experiments at BESSY I (epsilon(c) = 0.6 keV) and
ELSA (epsilon(c) = 1.4 and 2.5 keV) and corresponding Monte Carlo simu
lations are presented for 20 mu m resist layers on a gold plating base
.