NEW NEGATIVE TONE RESISTS FOR SUBHALF MICRON LITHOGRAPHY

New crosslinking type resist systems are described which use benzylic carbocation precursors carrying phenolic hydroxy group. The special fe ature of the new resists is the versatility of applications, ease of s ynthesis, high sensitivity, high contrast and a large process window. One such resist system has been used success fully in the back-end-of- the-line personalization for manufacturing advanced bipolar devices wh ich required an exceptionally large process window. The new resist sys tem is a promising candidate for surface imaging as well as for I-line , DUV and X-Ray applications.