CARBON AND HYDROGEN INCORPORATION IN ZNTE LAYERS GROWN BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION

Citation
H. Dumont et al., CARBON AND HYDROGEN INCORPORATION IN ZNTE LAYERS GROWN BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION, Journal of electronic materials, 23(2), 1994, pp. 239-242
Citations number
11
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
23
Issue
2
Year of publication
1994
Pages
239 - 242
Database
ISI
SICI code
0361-5235(1994)23:2<239:CAHIIZ>2.0.ZU;2-X
Abstract
The metalorganic chemical vapor deposition growth of ZnTe has been per formed at atmospheric pressure under helium and hydrogen carrier gases . Epitaxial growth was achieved on GaAs (100) substrates with the comb ination of diethylzinc and diethyltellurium as precursors. We have stu died the incorporation of carbon and hydrogen in as-grown layers of Zn Te by secondary ion mass spectroscopy analysis and out-diffusion exper iments with different carrier gases and growth temperatures. The amoun t of carbon and hydrogen incorporated in the ZnTe layers greatly depen ds on the nature of the gas considered. Under helium atmosphere, the a mount of carbon and hydrogen incorporated are greater than under H-2 w ith an origin from organometallic precursors.