H. Dumont et al., CARBON AND HYDROGEN INCORPORATION IN ZNTE LAYERS GROWN BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION, Journal of electronic materials, 23(2), 1994, pp. 239-242
The metalorganic chemical vapor deposition growth of ZnTe has been per
formed at atmospheric pressure under helium and hydrogen carrier gases
. Epitaxial growth was achieved on GaAs (100) substrates with the comb
ination of diethylzinc and diethyltellurium as precursors. We have stu
died the incorporation of carbon and hydrogen in as-grown layers of Zn
Te by secondary ion mass spectroscopy analysis and out-diffusion exper
iments with different carrier gases and growth temperatures. The amoun
t of carbon and hydrogen incorporated in the ZnTe layers greatly depen
ds on the nature of the gas considered. Under helium atmosphere, the a
mount of carbon and hydrogen incorporated are greater than under H-2 w
ith an origin from organometallic precursors.