ELIMINATION OF THICKNESS DEPENDENCE FROM MEDIUM RESOLUTION ELECTRON HOLOGRAMS

Citation
M. Gajdardziskajosifovska et Mr. Mccartney, ELIMINATION OF THICKNESS DEPENDENCE FROM MEDIUM RESOLUTION ELECTRON HOLOGRAMS, Ultramicroscopy, 53(3), 1994, pp. 291-296
Citations number
10
Categorie Soggetti
Microscopy
Journal title
ISSN journal
03043991
Volume
53
Issue
3
Year of publication
1994
Pages
291 - 296
Database
ISI
SICI code
0304-3991(1994)53:3<291:EOTDFM>2.0.ZU;2-X
Abstract
We show that a composition image that is independent of thickness can be obtained by suitably combining the phase and amplitude images extra cted from an off-axis electron hologram. This image is the product of the mean inner potential of the material and the mean-free-path for in elastic scattering. The method used has been evaluated using single cr ystal Si wedges with known linearly increasing thickness, and it has t hen been applied to CoSi2/Si epitaxial interfaces with unknown thickne ss. Thickness independent images of Si show constant contrast while im ages of hetero interface emphasize compositional differences.