Ks. Chou et Gk. Liu, EFFECTS OF EXCESS ZINC ON THE STRUCTURE OF REACTIVELY SPUTTERED ZINC-OXIDE FILMS, Materials chemistry and physics, 37(2), 1994, pp. 156-160
Experimental results from DC reactive sputtering of a zinc target for
growing zinc oxide films are reported. Special emphasis was placed on
conditions to obtain films with excess zinc and its effects on film st
ructures. Results suggested that competition between oxidation of the
zinc target and its rate of being sputtered away plays a critical role
in deciding the stoichiometry of grown films. This competition, in tu
rn, results from the coupled effects of DC power and oxygen fraction i
n the chamber. A higher oxygen fraction is needed to produce transpare
nt, stoichiometric and highly oriented films. Data showed that when a
slight excess of zinc was included in the ZnO film, its color (i.e. tr
ansparency) and columnar structure changes accordingly.