EFFECTS OF EXCESS ZINC ON THE STRUCTURE OF REACTIVELY SPUTTERED ZINC-OXIDE FILMS

Authors
Citation
Ks. Chou et Gk. Liu, EFFECTS OF EXCESS ZINC ON THE STRUCTURE OF REACTIVELY SPUTTERED ZINC-OXIDE FILMS, Materials chemistry and physics, 37(2), 1994, pp. 156-160
Citations number
14
Categorie Soggetti
Material Science
ISSN journal
02540584
Volume
37
Issue
2
Year of publication
1994
Pages
156 - 160
Database
ISI
SICI code
0254-0584(1994)37:2<156:EOEZOT>2.0.ZU;2-B
Abstract
Experimental results from DC reactive sputtering of a zinc target for growing zinc oxide films are reported. Special emphasis was placed on conditions to obtain films with excess zinc and its effects on film st ructures. Results suggested that competition between oxidation of the zinc target and its rate of being sputtered away plays a critical role in deciding the stoichiometry of grown films. This competition, in tu rn, results from the coupled effects of DC power and oxygen fraction i n the chamber. A higher oxygen fraction is needed to produce transpare nt, stoichiometric and highly oriented films. Data showed that when a slight excess of zinc was included in the ZnO film, its color (i.e. tr ansparency) and columnar structure changes accordingly.