PROPERTIES OF HIGHLY CONDUCTING NITROGEN-PLASMA-DOPED ZNSE-N THIN-FILMS

Citation
Ka. Bowers et al., PROPERTIES OF HIGHLY CONDUCTING NITROGEN-PLASMA-DOPED ZNSE-N THIN-FILMS, Journal of electronic materials, 23(3), 1994, pp. 251-254
Citations number
26
Categorie Soggetti
Engineering, Eletrical & Electronic","Material Science
ISSN journal
03615235
Volume
23
Issue
3
Year of publication
1994
Pages
251 - 254
Database
ISI
SICI code
0361-5235(1994)23:3<251:POHCNZ>2.0.ZU;2-T
Abstract
Values for the acceptor ionization energy, E(a), and compensating dono r ionization energy, E(d), have been obtained from an analysis of vari able-temperature photoluminescence data taken for a series of highly c onducting nitrogen-plasma doped ZnSe thin films. E(a) was found to be highly temperature dependent, with values ranging from E(a) approximat ely 110 meV at low temperatures to approximately 60 meV at room temper ature. The compensating donor ionization energy ranged from E(d) appro ximately 31 meV at low temperatures to approximately 24 meV at room te mperature. These results provide clear evidence of the nonhydrogenic n ature of the nitrogen acceptor state in heavily doped ZnSe:N thin film s and suggest that interstitial bonding of N, at two or more stable si tes, may play a central role in the p-type doping and compensation of this material at high doping levels.