DETECTION OF ERRORS IN MICROLITHOGRAPHIC GRATING FABRICATION USING A SIMPLE METHODOLOGY

Authors
HEISSMEIER M SHERIDAN JT SCHWIDER J STREIBL N
Citation
M. Heissmeier et al., DETECTION OF ERRORS IN MICROLITHOGRAPHIC GRATING FABRICATION USING A SIMPLE METHODOLOGY, Optik, 95(4), 1994, pp. 161-167
Citations number
12
Categorie Soggetti
Optics
Journal title
Optik → ACNP
ISSN journal
00304026
Volume
95
Issue
4
Year of publication
1994
Pages
161 - 167
Database
ISI
SICI code
0030-4026(1994)95:4<161:DOEIMG>2.0.ZU;2-6
Abstract
Microlithography is employed as a fabrication method in microelectroni cs, microoptics and micromechanics. The accuracy of the fabrication pr ocess can be investigated by the optical measurement of the diffractio n efficiencies of grating structures Both rigorous and approximate mod els are considered and compared with experimental results.