IN-SITU REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION OBSERVATION OF LASER-TRIGGERED GAP GROWTH IN CHEMICAL BEAM EPITAXY

Citation
M. Yoshimoto et al., IN-SITU REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION OBSERVATION OF LASER-TRIGGERED GAP GROWTH IN CHEMICAL BEAM EPITAXY, Journal of crystal growth, 136(1-4), 1994, pp. 89-93
Citations number
7
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
136
Issue
1-4
Year of publication
1994
Pages
89 - 93
Database
ISI
SICI code
0022-0248(1994)136:1-4<89:IRHEOO>2.0.ZU;2-R
Abstract
Surface reaction triggered by N2 laser irradiation onto adsorbed triet hylgallium (TEGa) and reaction with phosphorus in chemical beam epitax y (CBE) was studied by growth experiment and intensity change of refle ction high-energy electron diffraction (RHEED). The growth rate shows saturation with a high TEGa supply, which suggests that the adsorption of TEGa on a surface is saturated. The change of RHEED oscillation wa s different from that of a continuous reaction. The result showed that the decomposition of TEGa and formation of GaP occur alternately unde r continuous supply of TEGa and PH3.