GROWTH PARAMETER OPTIMIZATION OF SHORT-PERIOD (LESS-THAN-50-ANGSTROM INGAAS INP SHORT SHORT-PERIOD SUPERLATTICES BY CHEMICAL BEAM EPITAXY FOR PHOTONIC DEVICES/
C. Rigo et al., GROWTH PARAMETER OPTIMIZATION OF SHORT-PERIOD (LESS-THAN-50-ANGSTROM INGAAS INP SHORT SHORT-PERIOD SUPERLATTICES BY CHEMICAL BEAM EPITAXY FOR PHOTONIC DEVICES/, Journal of crystal growth, 136(1-4), 1994, pp. 293-296
In this work, we describe the influence of the growth parameters on op
tical and crystallographic properties of InGaAs/InP short period super
lattices (SPSLs). In particular, the optimized growth conditions appli
ed for multi-quantum wells (MQWs) are no longer valid when the total p
eriod thickness is below 85 angstrom and quasi-continuous growth inter
ruption times are required. Structures with 31 angstrom period thickne
ss with excellent high resolution X-Tay diffraction (HRXRD) and low te
mperature photoluminescence (PL) linewidth of 28 meV have been grown.
Differential transmission spectra of barrier reservoir and quantum wel
l electron transfer (BRAQWET) structures in which SPSLs substitute the
corresponding quaternary (1.25 mum) layer show similar behaviour in t
he corresponding structures.