HIGH-QUALITY INGAP AND INGAP INALP MULTIPLE-QUANTUM-WELL GROWN BY GAS-SOURCE MOLECULAR-BEAM EPITAXY/

Citation
Ch. Yan et al., HIGH-QUALITY INGAP AND INGAP INALP MULTIPLE-QUANTUM-WELL GROWN BY GAS-SOURCE MOLECULAR-BEAM EPITAXY/, Journal of crystal growth, 136(1-4), 1994, pp. 306-309
Citations number
5
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
136
Issue
1-4
Year of publication
1994
Pages
306 - 309
Database
ISI
SICI code
0022-0248(1994)136:1-4<306:HIAIIM>2.0.ZU;2-W
Abstract
Using gas-source molecular beam epitaxy, we have obtained high-quality GaInP and (AlGa)InP epilayers lattice-matched to (100) GaAs substrate s. All grown layers exhibited mirror-like surfaces. For a 1.7 mum thic k Ga0.5In0.5P film, the Hall electron mobility was 3400 and 30,000 CM2 /V. s at 300 and 77 K, respectively. The luminescence wavelength of (A lxGa1-x)InP samples ranged from 680 nm (for GaInP) to 590 nm (for AlIn P) at room temperature, and from 644 to 513 nm at 77 K. The multiple q uantum well (MQW) structure with well width of 40 angstrom showed stro ng luminescence intensity with wavelength of 647 nm (300 K) or 622 nm (80 K). The satellite peaks can be detected in double-crystal X-ray (D CXR) diffraction measurements of the MQW samples, which indicates the perfect structural periodicity.