PRECISE PROPERTY DETERMINATIONS OF ARSENOSILICATE GLASS THIN-FILMS USING INFRARED-SPECTROSCOPY

The combination of infrared spectroscopy and chemometric data analysis has been shown to provide a valuable method for rapid, nondestructive , at-line characterization of film properties for a variety of thin fi lms. We demonstrate the precise determination of As content and film t hickness for arsenosilicate glass thin films. Calibrations based on th e infrared data yielded standard errors of prediction of 0.10 wt. % an d 10 angstrom for the arsenic content and film thickness, respectively . Further, it is demonstrated that profiling the film properties acros s the wafer surface can increase the accuracy of the determinations by improving the correspondence of the infrared and reference property m easurements. This profiling also provides rapid information about spat ial variations of film properties.