Ty. Syau et al., COMPARISON OF ULTRALOW SPECIFIC ON-RESISTANCE UMOSFET STRUCTURES - THE ACCUFET, EXTFET, INVFET, AND CONVENTIONAL UMOSFETS, I.E.E.E. transactions on electron devices, 41(5), 1994, pp. 800-808
Three new ultralow specific on-resistance, vertical channel, power UMO
SFET structures, with a trench (UMOS) gate extending all the way betwe
en N+ source and the N+ substrate (drain), are compared with the conve
ntional UMOSFET structure. Specific on-resistances in the range of 100
-250 muOMEGAcm2 have been experimentally demonstrated for devices capa
ble of supporting 25 V. This is due to current conduction via an accum
ulation and/or inversion layer formed under gate bias along the trench
gate surface, resulting in the lowest specific on-resistance ever rep
orted.