Jh. Zhao et al., A NOVEL HIGH-POWER OPTOTHYRISTOR BASED ON ALGAAS GAAS FOR PULSED POWER-SWITCHING APPLICATIONS/, I.E.E.E. transactions on electron devices, 41(5), 1994, pp. 819-825
Double-side molecular beam epitaxial growth on a thick LEC-grown semi-
insulating (SI) GaAs wafer has been used to demonstrate a novel high p
ower optothyristor for pulsed power-switching applications. The optoth
yristor has a P+N-SI-PN+ thyristor-like structure with the capital P a
nd N stand for the wider bandgap optical window material, AlGaAs, and
the SI stands for a 650 mum SI-GaAs substrate. With the ''insertion''
of the SI-GaAs bulk material into the conventional P+NPN+ thyristor st
ructure and the use of wider bandgap AlGaAs, the device has achieved a
record high performance compared to the existing GaAs or AlGaAs/GaAs
based epitaxial thyristors. The performance of the optothyristors unde
r forward bias has been characterized, including 1) the low field dyna
mic current-voltage characteristics to show post-triggering carrier in
jections, 2) the switched-current waveforms with varying device blocki
ng voltage and from which the turn-on speed di/dt, and 3) the dependen
ce of the switched-current amplitude on the laser triggering position.