PHASE-SEPARATION IN ZNSE1-XSX AND ZN1-YMGYSE1-XSX LAYERS GROWN BY MOLECULAR-BEAM EPITAXY

Citation
Gc. Hua et al., PHASE-SEPARATION IN ZNSE1-XSX AND ZN1-YMGYSE1-XSX LAYERS GROWN BY MOLECULAR-BEAM EPITAXY, Journal of crystal growth, 138(1-4), 1994, pp. 367-372
Citations number
11
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
138
Issue
1-4
Year of publication
1994
Pages
367 - 372
Database
ISI
SICI code
0022-0248(1994)138:1-4<367:PIZAZL>2.0.ZU;2-P
Abstract
The occurrence of phase separation in (100) ZnSe1-xSx and Zn1-yMgySe1- xSx layers grown by molecular beam epitaxy was found by transmission e lectron microscopy. The direction of the phase separation is [011], an d the period of the composition modulation ranges from 300 to 500 angs trom. X-ray microanalysis of the two regions resulting from the phase separation showed one to be sulfur-rich and the other sulfur-deficient . The one-to-one correspondence of the wavy surface structure and the composition modulation suggests that the phase separation occurs via n onuniform incorporation of sulfur atoms into the wavy growth plane of the epilayer.