IN-SITU MONITORING BY SPECTROSCOPIC ELLIPSOMETRY IN ZNSE CRYSTAL-GROWTH BY MOLECULAR-BEAM EPITAXY

Citation
K. Kato et al., IN-SITU MONITORING BY SPECTROSCOPIC ELLIPSOMETRY IN ZNSE CRYSTAL-GROWTH BY MOLECULAR-BEAM EPITAXY, Journal of crystal growth, 138(1-4), 1994, pp. 373-378
Citations number
14
Categorie Soggetti
Crystallography
Journal title
ISSN journal
00220248
Volume
138
Issue
1-4
Year of publication
1994
Pages
373 - 378
Database
ISI
SICI code
0022-0248(1994)138:1-4<373:IMBSEI>2.0.ZU;2-L
Abstract
We report the first in-situ monitoring by spectroscopic ellipsometry ( SE) of the heteroepitaxial growth of ZnSe on GaAs by molecular beam ep itaxy. In a series of experiments wherein ZnSe was grown on GaAs subst rates or epilayers having various reconstructed GaAs surfaces, the tra jectories of (PSI, DELTA) and dielectric function spectra were measure d and analyzed. It was found that the As-rich c(4 x 4), the As-deficie nt (6 x 4) and the Ga-rich (4 x 2) reconstructed GaAs surfaces resulte d in two-dimensional (layer-by-layer), pseudo-two-dimensional, and thr ee-dimensional growth of ZnSe, respectively, and it was also found tha t the dielectric function of the as-grown ZnSe is quite different from that of the air-exposed ZnSe epilayer.